Magnesium Oxide Sputtering Target

Magnesium Oxide Sputtering Target

Purity: 99.9%

  • Custom sizes and standard sizes in stock
  • Competitive Price
  • Quick Lead Time

  • Magnesium Oxide Sputtering Target is a ceramic material used in physical vapor deposition (PVD) processes to create thin films with insulating, optical, or dielectric properties. It offers high thermal stability, excellent insulation performance, and strong resistance to chemical corrosion, making it a reliable choice for coating applications in electronics, optics, and semiconductor industries. This target is typically used for depositing MgO films on substrates like glass, silicon, or metal to improve electrical insulation or optical reflectivity. We can supply high-quality magnesium oxide sputtering target with various specifications and competitive prices, offering customized solutions to meet specific requirements.
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Magnesium Oxide Sputtering Target Data Sheet

Reference Code:

HTST37

Color:

White or yellow

Chemical Formula:

MgO

Density:

3.20 g/cm3

Dimension:

customized

Shape:

Disc/Rectangular/Tube or customized

Bonding:

Bonding/Unbonding

Magnesium Oxide Sputtering Target Description

Magnesium oxide sputtering target is widely used in thin film deposition for its excellent dielectric strength, high melting point, and chemical inertness. It enables the formation of stable, uniform coatings in various applications, including optical layers, barrier films, and electronic components. Its compatibility with different substrate materials and ability to perform under high-vacuum and high-temperature conditions make it a dependable material in PVD processes.

Magnesium Oxide Sputtering Target Specifications

Circular Sputtering Targets

Diameter

1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0” up to 21”

Rectangular Sputtering Targets

Width x Length

5” x 12”, 5” x 15”, 5” x 20”, 5” x 22”, 6” x 20”

Thickness

0.125”, 0.25”

Magnesium Oxide Sputtering Target Features

  1. High Purity: Offers excellent chemical stability and minimizes contamination during thin film deposition.
  2. Strong Thermal Stability: Maintains structural integrity at elevated temperatures during sputtering processes.
  3. Good Electrical Insulation: Ideal for applications requiring high dielectric strength and minimal conductivity.
  4. Uniform Film Formation: Ensures consistent and smooth thin film layers across various substrates.
  5. Customizable Dimensions: Available in various shapes and sizes to meet different equipment and process requirements.

Magnesium Oxide Sputtering Target Applications

  • Optical Coatings: Used to deposit MgO thin films on lenses, mirrors, and optical devices to enhance reflectivity and durability.
  • Semiconductor Fabrication: Applied in thin film transistors and insulating layers due to its excellent dielectric properties.
  • Magnetic Storage Media: Forms part of multilayer structures in hard drives and magnetic sensors.
  • Display Technologies: Utilized in the production of thin film coatings for OLED and LCD display panels.
  • Protective Coatings: Serves as a barrier layer against corrosion and oxidation in various industrial applications.
  • Metal Smelting
    Metal Smelting
  • Electronic Devices
    Electronic Devices
  • Thermal Management Techniques
    Thermal Management Techniques
  • Aerospace Applications HM
    Aerospace

Magnesium Oxide Material Properties

Property

Value

Unit

Specific Gravity (S.G)

3.58

g/cm³

Porosity

10

%

Vickers Hardness (HV1)

650

HV

Flexural Strength

105

MPa

Compressive Strength

275

MPa

Young’s Modulus

2.1 x 10¹¹

Pa (N/m²)

Fracture Toughness

1.8

MPa·m^1/2

Property

Value

Unit

Coefficient of Thermal Expansion

40℃ to 400℃

10.0 × 10⁻⁶

/°C

40℃ to 800℃

10.5 × 10⁻⁶

/°C

Thermal Conductivity

42

W/m·K

Specific Heat

0.92

J/g·°C

Dielectric Strength (Thermal Shock Resistance)

17

kV/mm

Property

Value

Unit

Volume Resistivity

At 20°C

> 1014

Ω·cm

At 500°C

> 108

Ω·cm

Permittivity (Dielectric Constant)@ 1 MHz

9.8

C²/(N·m²) or (Dimensionless)

Dielectric Loss Tangent@ 1 MHz

1 × 10⁻⁴

–

Magnesium Oxide Ceramic Machining

Magnesium Oxide Ceramic Machining

Magnesium oxide can be machined in green or bisque form before sintering, and to a limited extent in its fully sintered state. In its pre-sintered state, the material is relatively soft and easier to shape, but like many ceramics, it undergoes significant shrinkage—up to 20%—during sintering, which can affect final dimensions. Fully sintered magnesium oxide is very hard and brittle, requiring diamond tools and precision equipment for any post-sintering machining.

Machining Methods and Considerations

  • Green or Bisque Machining: Easier to cut and form, suitable for complex shapes before firing.
  • Sintering Shrinkage: Expect about 15–20% dimensional reduction during sintering, which impacts tolerance control.
  • Post-Sintering Machining: Requires diamond grinding tools due to the material’s hardness and brittleness.
  • Fragility: Fully sintered MgO is prone to chipping and fracture if not handled with care during machining.
  • Tooling and Time: Machining dense MgO ceramics is time-consuming and requires specialized equipment.

Magnesium Oxide Ceramic Packaging

Magnesium oxide ceramic products are typically packaged in vacuum-sealed bags to prevent moisture or contamination and wrapped with foam to cushion vibrations and impacts during transport, ensuring the quality of products in their original condition.

ceramic products packing HM

Download

  • Magnesium Oxide Data Sheet_PDS
  • SAFETY DATA SHEET (SDS) – Magnesium Oxide Ceramic

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We will check and get back to you in 24 hours

To customize your magnesium oxide sputtering target, please provide the following details:

  • Dimensions: Length, Width, Diameter, Thickness, etc.
  • Shape: Rectangular, round, or tube.
  • Tolerances: Specify the required tolerances.
  • Purity of the sputtering target
  • Application: Indicate the intended application or industry.
  • Backing Plate: If bonding service is required, please specify the material and dimensions of the backing plate.
  • Quantity of the products you need
  • Alternatively, you can provide a drawing with your specifications.

Once we have these details, we can provide you with a quote within 24 hours. provide you with a quote within 24 hours.

We carry a wide variety of graphite ceramic products in stock, and for these, there is generally no minimum order requirement. However, for custom orders, we typically set a minimum order value of $200. The lead time for stock items is usually 1-2 weeks, while custom orders usually take 3-4 weeks, depending on the specifics of the order.

A magnesium oxide sputtering target is used to deposit thin MgO films onto substrates for applications in optics, semiconductors, magnetic storage, and display technologies.

Yes, due to its insulating nature, magnesium oxide is commonly used with RF sputtering systems.

Advanced Ceramic Hub, established in 2016 in Colorado, USA, is a specialized supplier and manufacturer of graphene products. With extensive expertise in supply and export, we offer competitive pricing and customized solutions tailored to specific requirements, ensuring outstanding quality and customer satisfaction. As a professional provider of ceramics, refractory metals, specialty alloys, spherical powders, and various advanced materials, we serve the research, development, and large-scale industrial production needs of the scientific and industrial sectors.

Magnesium Oxide Sputtering Target

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