Aluminum Nitride Sputtering Target

Aluminum Nitride Sputtering Target HM

Aluminum Nitride Sputtering Target

Purity: 95%-99%

  • Custom sizes and standard sizes in stock
  • Competitive Price
  • Quick Lead Time
  • Aluminum Nitride Sputtering Target is made from high-purity aluminum oxide with uniform composition and dense structure, widely used in thin film deposition and the semiconductor industry. As a leading supplier and manufacturer of premium aluminum nitride products, we can supply high-quality aluminum nitride sputtering targets with various specifications and competitive prices, offering customized solutions to meet specific requirements.

Or email us at sales@heegermaterials.com.

Aluminum Nitride Sputtering Target Data Sheet

Reference Code:

HMST457

Purity:

99.5%-99.9%

Density:

3.26 g/cm3

Appearance:

Bluish White, Crystalline Solid

Shape:

Rectangular, Disc, or Tube

Bonding Service:

Unbonding, or Bonding

Melting Point:

>2200℃

Z Ratio:

1.00

Sputter:

RF-R

Max Power Density:

20 W/in²

Aluminum Nitride Sputtering Target

Aluminum Nitride (AlN) Sputtering Target is a high-performance ceramic sputtering target material, featuring exceptional thermal conductivity, electrical resistivity, and hardness. Its uniform composition and dense structure make it ideal for producing smooth, defect-free films through magnetron sputtering or ion beam deposition. They are widely used in microelectronics, optoelectronics, and photovoltaics. Advanced Ceramics Hub can provide customized solutions in terms of purity, size, density, and other parameters to meet diverse industrial and research applications.

Aluminum Nitride Sputtering Target Specifications

ircular Sputtering Targets

Diameter

1.0″
2.0″
3.0″
4.0″
5.0″
6.0″
up to 21″

Rectangular Sputtering Targets

Width x Length

5” x 12″
5” x 15″
5” x 20″
5” x 22″
6” x 20″

Thickness

0.125″, 0.25″

Aluminum Nitride Sputtering Target Features

  • High purity and density
  • Low particle
  • Uniform film thickness distribution
  • High efficiency in the use

Aluminum Nitride Sputtering Target Applications

  • Semiconductor Industry: The aluminum nitride (AlN) sputtering target is commonly used in thin-film deposition for insulating and passivation layers and as a buffer layer in GaN-based devices (e.g., HEMTs).
  • Optoelectronics: The aluminum nitride (AlN) sputtering target is the key material for UV LEDs and laser diodes due to its wide bandgap (6.2 eV) and transparency to ultraviolet light.
  • Acoustic Wave Devices: Deposited as piezoelectric films for surface acoustic wave (SAW) and bulk acoustic wave (BAW) sensors/resonators in 5G/6G filters.
  • Protective Coatings: The aluminum nitride (AlN) sputtering target can provide wear-resistant and thermally stable coatings for aerospace/components.
  • Thermal Management: High thermal conductivity (~320 W/m·K) makes it ideal for heat dissipation in high-power electronics.

Aluminum Nitride Sputtering Target Quality Control

composition ananlysis icon

Raw Material Composition Analysis

Impurities are analyzed using ICP and GDMS for metals, and carbon-sulfur and nitrogen-oxygen analyzers for non-metals, ensuring purity meets required standards.

Metallographic Inspection Icon

Metallographic Inspection

Detection equipment is used to inspect the target material for internal defects or shrinkage holes, while metallographic testing ensures the grain structure is fine and dense.

dimension checking icon

Appearance and Dimensional Inspection

Micrometers and calipers measure dimensions, while a cleanliness instrument checks surface smoothness and cleanliness.

Aluminum Nitride Material Properties

Property

Unit

HMAN1000

HMAN2000

HMAN3000

HMAN4000

HMAN1000S

Density

g/cm3

3.32

3.32

3.32

3.30

3.30

Young’s Modulus

GPa

 300-350

300-350

300-350

300-350

350

Fracture Toughness KIC

MPa m1/2

3

3

3

2.5

3

Poisson’s Ratio

 0.22

0.22

0.22

0.22

0.22

Compressive Strength

MPa

3000

3000

3000

3000

3000

Flexural Strength @ 25°C

MPa

350

350

350

350

350

Hardness

GPa

10

10

10

12

11

Property

Unit

HMAN1000

HMAN2000

HMAN3000

HMAN4000

HMAN1000S

Thermal Conductivity @ 25°C

W/mK

170

200

230

200

170

CTE 25°C ➞ 400°C

10-6/K

4.5

4.5

4.5

3.5

4.6

Max Temperature (Air)

°C

1200

1200

1200

1200

1200

Max Temperature (Inert)

°C

1200

1200

1200

1200

1200

Property

Unit

HMAN1000

HMAN2000

HMAN3000

HMAN4000

HMAN1000S

Dielectric Constant

1 MHz

8.8

8.8

8.5

8.5

8.8

Dielectric Loss

1 MHz

5×10-4

5×10-4

5×10-4

5×10-4

5×10-4

Dielectric Strength DC @ 25°C

kV/mm

15

15

15

15

14

Volume Resistivity @ 25°C

ohm-cm

 >1013

>1013

>1013

 >1014

 >1014

Aluminum Nitride Material Grades

HMAN1000 is our standard high purity aluminium nitride with a thermal conductivity of 170 W/mK. This is the same thermal performance as our substrate material but offers the possibility of larger pieces in length/width and in thicknesses up to 30mm.
HMAN1000 has good coefficient of thermal expansion – matched to silicon and gallium nitride over wide temperature ranges.

HMAN100 Applications:

  • High power insulators
  • Laser components
  • Water cooled heatsinks
  • Power electronics
  • Aerospace, medical and semiconductor components

HMAN1000S 170 W/mK is our standard high thermal conductivity substrate material, However, other high-performance grades are also available.

HMAN1000S Applications:

  • Heat sinks
  • Heat spreaders
  • Laser heatsinks power rectifiers
  • Aerospace, power electronics, rectifiers

HMAN2000 is one of our enhanced grades of aluminium nitride, offering all the mechanical performance of HMAN1000 with the enhanced benefits of 200 W/mK thermal conductance.

HMAN2000 Applications:

  • Heat sinks
  • Heat spreaders
  • Laser heatsinks power rectifiers
  • Aerospace, power electronics, rectifiers

HMAN3000 is one of our enhanced grades of aluminium nitride offering, all the mechanical performance of HMAN1000 with the enhanced benefits of 230 W/mK thermal conductance.

HMAN3000 Applications:

  • Heat sinks
  • Heat spreaders
  • Laser heatsinks power rectifiers
  • Aerospace, power electronics, rectifiers

HMAN4000 is one of our enhanced grades of aluminium nitride offering, all the mechanical performance of HMAN1000 with the enhanced benefits of 200 W/mK thermal conductance.

HMAN4000 Applications:

  • Heat sinks
  • Heat spreaders
  • Laser heatsinks power rectifiers
  • Aerospace, power electronics, rectifiers

Machining of aluminum nitride ceramic

Ceramic Machining HM

Machining aluminum nitride (AlN) ceramics is a precision process used to manufacture high-performance components from aluminum nitride materials. Machining aluminum nitride ceramics requires specialized equipment and techniques to address their brittleness and hardness. Proper tooling and controlled environments are essential to prevent material damage and achieve the desired surface finish and dimensional accuracy. Common machining methods include:

  • Diamond cutting:  Diamond tools are used to achieve fine precision and smooth surface finishes, ideal for complex shapes.
  • Laser cutting:  A non-contact method used for intricate shapes, with high precision and minimal thermal impact.
  • Precision grinding:  Used to achieve fine tolerances and surface finishes. Requires special care to prevent cracking or chipping due to the fragility of ceramics.
  • Wire electrical discharge machining (EDM):  A method often used for intricate cuts, especially for fine and complex geometries.

Aluminum Nitride Ceramic Packaging

Aluminum Nitride Ceramic products are typically packaged in vacuum-sealed bags to prevent moisture or contamination and wrapped with foam to cushion vibrations and impacts during transport, ensuring the quality of products in their original condition.

ceramic products packing HM

Download

Get A Quote

We will check and get back to you in 24 hours

To customize your aluminum nitride sputtering target, please provide the following details:

  1. Dimensions: Length, Width, Diameter, Thickness, etc.
  2. Shape: Rectangular, round, or tube.
  3. Tolerances: Specify the required tolerances.
  4. Purity of the sputtering target
  5. Application: Indicate the intended application or industry.
  6. Backing Plate: If bonding service is required, please specify the material and dimensions of the backing plate.
  7. Quantity of the products you need
  8. Alternatively, you can provide a drawing with your specifications.

Once we have these details, we can provide you with a quote within 24 hours.

We carry a wide variety of boron nitride products in stock, and for these, there is generally no minimum order requirement. However, for custom orders, we typically set a minimum order value of $200. The lead time for stock items is usually 1-2 weeks, while custom orders usually take 3-4 weeks, depending on the specifics of the order.

Purity, Density, Target Composition, and specific application requirements.

They are manufactured through a process of high-temperature sintering, followed by precision machining to meet specific size and purity requirements.

Advanced Ceramic Hub, established in 2016 in Colorado, USA, is a specialized supplier and manufacturer of graphene products. With extensive expertise in supply and export, we offer competitive pricing and customized solutions tailored to specific requirements, ensuring outstanding quality and customer satisfaction. As a professional provider of ceramics, refractory metals, specialty alloys, spherical powders, and various advanced materials, we serve the research, development, and large-scale industrial production needs of the scientific and industrial sectors.

Aluminum Nitride Sputtering Target

Related Products

Leave a Reply

Your email address will not be published. Required fields are marked *